Suteera Tessiri. 2000. Poly[methlyl methacrylate-co-methacrylic acid] for UV-sensitive aqueous-base developable lithographic plate. Field of Study Petrochemistry and Polymer Science, Chulalongkorn University;
Suteera Tessiri. (2000) Poly[methlyl methacrylate-co-methacrylic acid] for UV-sensitive aqueous-base developable lithographic plate . Chulalongkorn University/Bangkok.
Suteera Tessiri. Poly[methlyl methacrylate-co-methacrylic acid] for UV-sensitive aqueous-base developable lithographic plate. . Bangkok:Chulalongkorn University, 2000.
Suteera Tessiri. (2000) Poly[methlyl methacrylate-co-methacrylic acid] for UV-sensitive aqueous-base developable lithographic plate . Chulalongkorn University/Bangkok.