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Nipapan Poolamai. 2005. Integration of high-k gate dielectrics in silicon based semiconductor technology. Faculty of Science, Agriculture and Engineering, University of Newcastle upon Tyne;
Nipapan Poolamai. (2005) Integration of high-k gate dielectrics in silicon based semiconductor technology . University of Newcastle upon Tyne/Tyne.
Nipapan Poolamai. Integration of high-k gate dielectrics in silicon based semiconductor technology. . Tyne:University of Newcastle upon Tyne, 2005.
Nipapan Poolamai. (2005) Integration of high-k gate dielectrics in silicon based semiconductor technology . University of Newcastle upon Tyne/Tyne.