Rardchawadee Silapunt. 2004. Ion bombardment energy control for fluorocarbon plasma etching of organosilicate glass. Field of Study Electrical Engineering, University of Wisconsin-Madison;
Rardchawadee Silapunt. (2004) Ion bombardment energy control for fluorocarbon plasma etching of organosilicate glass . University of Wisconsin-Madison/Madison.
Rardchawadee Silapunt. Ion bombardment energy control for fluorocarbon plasma etching of organosilicate glass. . Madison:University of Wisconsin-Madison, 2004.
Rardchawadee Silapunt. (2004) Ion bombardment energy control for fluorocarbon plasma etching of organosilicate glass . University of Wisconsin-Madison/Madison.